WebThe TWINSCAN NXT:2050i is where state-of-the-art immersion lithography system design meets advanced lens design with a numerical aperture (NA) of 1.35 – the highest in the semiconductor industry right now. This step-and-scan system is a high-productivity, dual-stage tool designed for volume production. WebCLEAN TRACK™ LITHIUS Pro™ Z Coater/Developer Coater/developer for 300/200mm wafers. This is the latest platform that supports EUV and other advanced lithography …
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Webヒット商品を支えた知的財産権 Vol.51半導体の高生産性を実現する「CLEAN TRACK LITHIUS Pro-i」. 商標登録 CLEAN TRACK:第2718814号、LITHIUS Pro:第5143203号. 半導体は、コンピュータや携帯電話といった情報通信機器をはじめ、家電など身近な製品の多くに使用されてい ... Web18 aug. 2024 · 도쿄일렉트론은 디바이스용 레이저 엣지 트리밍 장치 Ulucus L을 판매를 시작했다고 합니다. Ulucus L은 첨단 레이저 엣지 트리밍 장치로써 LITHIUS Pro Z에 융합시켜 전공정에서의 수율을 높이고 질 좋은 반도체를 양산하는데에 큰 도움을 줍니다. side effects of ibuprofen 800 mg tablets
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